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First Nano launched the EasyTube™ System in early November 2001. Various academic research centers, industry leaders, and government research labs worldwide have purchased the system and are employing it currently in their research. CVD Equipment Corporation purchased the assets of First Nano in the spring of 2005. First Nano operates as a division of CVD Equipment Corporation.
First Nano specializes in the manufacture of innovative, high quality process equipment suitable for the synthesis of a variety of one-dimensional nanostructures and nanomaterials. The EasyTube™ System is applicable to nanoscale research that intersects cross-functional disciplines in semiconductor, applied physics, biotechnology, chemical, and mechanical engineering fields.
We provide specialized solutions for nanotube/nanowire synthesis. Our engineering team can design customized systems for specific applications and research development. |
EasyPanel™ System

UHP Gas Panels for high and low pressure, Ultra-High-Purity (UHP) gas delivery...
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EasyExhaust™ System

High Temperature Pyrolizing Furnace and Water Scrubbing System capable of continually thermally...
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EasyGas™ 1000

High Quality Gas Cabinets and Gas Delivery Systems designed to cover a wide range of cylinder gas delivery...
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EasyGas™ 1500

Fully Automated Gas Cabinet providing reliable Ultra-High-Purity (UHP) specialty gas equipment...
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EasyTube™ 101

Advanced CVD process development tool for the University or Industrial Researcher...
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EasyTube™ 2000

Advanced turnkey thermal catalytic CVD process tool for synthesis of nanotube and nanowire...
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EasyTube™ 2000 - VACNT Array

Vertically Aligned CNT array...
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EasyTube™ 2000 - Fastcool™ Furnace

FastCool™ Furnace for High Throughput, provides better temperature stability and uniformity over...
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EasyTube™ 2000 - Automated Wafer Loading

Ensures contamination-free handling and consistent gas sealing ...
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EasyTube™ 2000 - Hot Loader and FastCool™ Furnace

Hot Loader to Load Sample into a Pre-Heated Chamber....
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EasyTube™ 3000

Advanced Catalytic CNT and Nanowire CVD System process tool for...
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EasyTube™ 3000 - RF Plasma

Remote RF Plasma used to ionize gas prior to entering the thermal deposition...
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EasyTube™ 3000 - CNT Batch Synthesis

Vertically aligned CNT's are produced on a batch of 4" wafers...
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EasyTube™ 3000 - High Throughput Loader

The High Throughput Loader enables fast sample heating to improve nanotube...
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EasyTube™ 3000 - Infrared Heating Furnace

Infrared Heating Furnace provides Rapid Thermal Process (RTP) capability...
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EasyTube™ 4000

Advanced Plasma Enhanced CVD process tool for the synthesis of...
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EasyTube™ 4000 - PECVD Deposition Chamber

PECVD Deposition chamber for a 4", 6" or 8" wafer...
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EasyTube™ 6000

Advanced Multi-Tube Furnace System for Carbon Nanotubes (CNT), Nanowires, Oxidation...
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EasyTube™ 6000 - Batch Wafer Process

Utilizes a Cantilevered Loading System and has...
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First Nano, a Division of
CVD Equipment Corporation
1860 Smithtown Avenue
Ronkonkoma, NY 11779 USA
(P) 631.981.7081
(F) 631.981.7095 |