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First Nano, a Division of CVD Equipment Corporation
1860 Smithtown Ave
Ronkonkoma, NY 11779
Tel: (631) 981-7081
Fax: (631) 981-7095


Worldwide Sales:

Tel: (631) 981-7081
Fax: (631) 981-7095
sales@firstnano.com

click here for a list of our international distributors.


General Information:

Tel: (631) 981-7081
info@firstnano.com


Technical Support:

Tel: (631) 981-7081
tech@firstnano.com or click here to fill out our support form.


Employment Opportunities:

hr@firstnano.com

EasyPanel™ System

easypanel uhp gas panel

UHP Gas Panels for high and low pressure, Ultra-High-Purity (UHP) gas delivery...
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EasyExhaust™ System

easyexhaust system - high temp furnace and water scrubbing system

High Temperature Pyrolizing Furnace and Water Scrubbing System capable of continually thermally...
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EasyGas™ 1000

easygas 1000 gas cabinet

High Quality Gas Cabinets and Gas Delivery Systems designed to cover a wide range of cylinder gas delivery...
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EasyGas™ 1500

easygas 1500 gas cabinet

Fully Automated Gas Cabinet providing reliable Ultra-High-Purity (UHP) specialty gas equipment...
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EasyTube™ 101

easytube 101 advanced cvd process tool

Advanced CVD process development tool for the University or Industrial Researcher...
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EasyTube™ 2000

easytube 2000 thermal cvd

Advanced turnkey thermal catalytic CVD process tool for synthesis of nanotube and nanowire...
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EasyTube™ 2000 - VACNT Array

vertically aligned CNT

Vertically Aligned CNT array...
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EasyTube™ 2000 - Fastcool™ Furnace

high throughput furnace

FastCool™ Furnace for High Throughput, provides better temperature stability and uniformity over...
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EasyTube™ 2000 - Automated Wafer Loading

easytube 2000 Automated Wafer Loading

Ensures contamination-free handling and consistent gas sealing ...
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EasyTube™ 2000 - Hot Loader and FastCool™ Furnace

Hot Loader and FastCool™ Furnace

Hot Loader to Load Sample into a Pre-Heated Chamber....
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EasyTube™ 3000

easytube 3000 cnt and nanowire cvd system

Advanced Catalytic CNT and Nanowire CVD System process tool for...
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EasyTube™ 3000 - RF Plasma

easytube 3000 rf plasma

Remote RF Plasma used to ionize gas prior to entering the thermal deposition...
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EasyTube™ 3000 - CNT Batch Synthesis

EasyTube™ 3000 - CNT Batch Synthesis

Vertically aligned CNT's are produced on a batch of 4" wafers...
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EasyTube™ 3000 - High Throughput Loader

The High Throughput Loader enables fast sample heating to improve nanotube...
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EasyTube™ 3000 - Infrared Heating Furnace

EasyTube™ 3000 - Infrared Heating Furnace

Infrared Heating Furnace provides Rapid Thermal Process (RTP) capability...
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EasyTube™ 4000

easytube 4000 advanced plasma cvd system

Advanced Plasma Enhanced CVD process tool for the synthesis of...
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EasyTube™ 4000 - PECVD Deposition Chamber

EasyTube™ 4000 - PECVD Deposition Chamber

PECVD Deposition chamber for a 4", 6" or 8" wafer...
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EasyTube™ 6000

easytube 6000 advanced multi furnace system

Advanced Multi-Tube Furnace System for Carbon Nanotubes (CNT), Nanowires, Oxidation...
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EasyTube™ 6000 - Batch Wafer Process

EasyTube™ 6000 - Batch Wafer Process

Utilizes a Cantilevered Loading System and has...
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First Nano, a Division of
CVD Equipment Corporation
1860 Smithtown Avenue
Ronkonkoma, NY 11779 USA
(P) 631.981.7081
(F) 631.981.7095


© 2010 First Nano, a Division of CVD Equipment Corporation
1860 Smithtown Ave | Ronkonkoma, NY 11779 | Tel 631.981.7081 | Fax 631.981.7095
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