
Our Privacy Policy is designed to assist you in understanding how we collect and use the personal information you provide to us and to assist you in making informed decisions when using our site.
What information do we collect:
What information do we collect:
When you visit our website you may provide us with two types of information: personal information you knowingly choose to disclose that is collected on an
individual basis and website use information collected on an aggregate basis as you and others browse our site.
In order to help us understand how our visitors engage in our site, we use Google Analytics. They collect information anonymously which reports website trends without identifying individual visitors. Analytics uses its own cookie to track visitor interactions. The cookie is used to store information, such as what time the current visit occurred, whether the visitor has been to the site before, and what site referred the visitor to the web page. To disable this type of cookie, some browsers will indicate when a cookie is being sent and allow you to decline cookies on a case-by-case basis.
What we do with the Personal info you provide:
If you choose to correspond with us via info@firstnano.com or through our RFQ page, we may retain the content of your messages together with your email address and our responses.
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EasyPanel™ System

UHP Gas Panels for high and low pressure, Ultra-High-Purity (UHP) gas delivery...
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EasyExhaust™ System

High Temperature Pyrolizing Furnace and Water Scrubbing System capable of continually thermally...
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EasyGas™ 1000

High Quality Gas Cabinets and Gas Delivery Systems designed to cover a wide range of cylinder gas delivery...
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EasyGas™ 1500

Fully Automated Gas Cabinet providing reliable Ultra-High-Purity (UHP) specialty gas equipment...
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EasyTube™ 101

Advanced CVD process development tool for the University or Industrial Researcher...
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EasyTube™ 2000

Advanced turnkey thermal catalytic CVD process tool for synthesis of nanotube and nanowire...
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EasyTube™ 2000 - VACNT Array

Vertically Aligned CNT array...
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EasyTube™ 2000 - Fastcool™ Furnace

FastCool™ Furnace for High Throughput, provides better temperature stability and uniformity over...
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EasyTube™ 2000 - Automated Wafer Loading

Ensures contamination-free handling and consistent gas sealing ...
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EasyTube™ 2000 - Hot Loader and FastCool™ Furnace

Hot Loader to Load Sample into a Pre-Heated Chamber....
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EasyTube™ 3000

Advanced Catalytic CNT and Nanowire CVD System process tool for...
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EasyTube™ 3000 - RF Plasma

Remote RF Plasma used to ionize gas prior to entering the thermal deposition...
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EasyTube™ 3000 - CNT Batch Synthesis

Vertically aligned CNT's are produced on a batch of 4" wafers...
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EasyTube™ 3000 - High Throughput Loader

The High Throughput Loader enables fast sample heating to improve nanotube...
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EasyTube™ 3000 - Infrared Heating Furnace

Infrared Heating Furnace provides Rapid Thermal Process (RTP) capability...
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EasyTube™ 4000

Advanced Plasma Enhanced CVD process tool for the synthesis of...
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EasyTube™ 4000 - PECVD Deposition Chamber

PECVD Deposition chamber for a 4", 6" or 8" wafer...
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EasyTube™ 6000

Advanced Multi-Tube Furnace System for Carbon Nanotubes (CNT), Nanowires, Oxidation...
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EasyTube™ 6000 - Batch Wafer Process

Utilizes a Cantilevered Loading System and has...
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First Nano, a Division of
CVD Equipment Corporation
1860 Smithtown Avenue
Ronkonkoma, NY 11779 USA
(P) 631.981.7081
(F) 631.981.7095 |