EasyTube™ 2000

Advanced Catalytic CNT and Nanowire System

Download ET 2000 Brochure

Turnkey solution for nanomaterial synthesis

EasyTube™ 2000 is an advanced turnkey thermal catalytic chemical vapor deposition process tool for the synthesis of a variety of nanotube and nanowire. The system is optimized for controlled process development and user safety.

PC Controlled Recipe Driven Software

EasyTube™ 2000 is easy to use with a PC controlled recipe driven software that automatically acquires and logs data for verifiable repeatability.

The graphical user interface (GUI) allows users to logically access preprogrammed recipes, modify and/or create recipes, and view real time execution data.

Innovative Modular Design

EasyTube™ 2000’s modular platform houses several key process components including the process chamber, computer control system, auto loader, pumps, UHP gas and vapor delivery system - all for maximum system flexibility. Options are field upgradable.

Designed to Meet Stringent Safety Standards

EasyTube™ 2000 is designed to meet today’s more stringent safety standards. Some standard safety features include automatic inert purge, redundant interlocks for all critical alarm conditions, integrated gas leak detection, exhaust gas dilution and more. Alarms are displayed
on the monitor, audibly announced, data logged and can be remotely transmitted.

FastCool™ Furnace for High Throughput

The EasyTube™ 2000 offers the FastCool™ furnace for high throughput. The resistance furnace automatically
opens at multiple steps during the cooling stage to reduce the cooling time from more than 3 hours to less than
1 hour. With this standard feature, typical CNT growth recipe can be FastCool™ Furnace for High Throughput finished within 2 hours.

Synthesis Made Easy

EasyTube™ 2000 is "synthesis made easy" for many different nanostructures including single wall CNT, multi-wall CNT and nanowires by using combinations of hydrides and liquid/solid precursors. Automated sample loading ensures consistent gas sealing integrity for increased repeatability.

Our field proven system performance and solid customer base establishes First Nano as the clear choice in leading edge nanotechnology development equipment for the advanced research facility.

EasyTube™ 2000 Standard Configuration:

• Windows™ Based Computer Controlled Operations, Data Logging, Safety Interface and Recipe Generation
• Preprogrammed Recipes for SWCNT, MWCNT, Aligned CNT and Nanowire
• Resistance Furnace for Temperatures >1100 °C
• High Throughput with FastCool™ Furnace
• Proprietary Real-Time Cascade Process Temperature Control
• Cantilevered Automatic Loading System
• 3” Quartz Reaction Chamber
• Four (4) Mass Flow Controlled UHP Gas Lines
• Comprehensive Software and Hardware Safety Interlocks
• 1 Year Warrenty
• Semi - S2/S8 and CE® Certified

EasyTube™ 2000 Modular Component Options:

• Multi-zone Furnace with Proprietary Real-Time Cascade Process Temperature Control
• Resistance Heating High Temperature Furnace to
  > 1250 °C
• Infrared (IR) Heating for Rapid Thermal Processing
  (RTP) > 1150 °C
• Low Pressure Operation (100 – 700 torr),
  < 50 mtorr Base Pressure
• Solid Source Vapor Delivery Kit for Oxide or Nitride Nanowire
• Liquid Precursor Vapor Delivery Kit
• Bubbler Liquid Auto Refill
• Rectangular Process Tubes for Improved Laminar Gas Flow
• DC Bias Field Assisted Growth
• Residual Gas Analyzer
• Additional Mass Flow Controlled UHP Gas Lines up to 8 Lines
• Air to Water Heat Exchanger for Cooling Water
• EasyGas™ Hazardous Gas Cabinets, EasyPanel™ UHP Gas Panels, EasyExhaust™ Gas Conditioning System

* Note: Electrical varies with country; facilities requirements vary with system options. Consult Factory for details.