CVD Equipment Corporation > First Nano Follow us on     cvd equipment youtube our divisions & subsidiary:

First Nano, a division of CVD Equipment

enabling tomorrow's technologies™

Questions & Answers

CLICK HERE FOR OUR EASYTUBE® SYSTEM COMPARISON

  1. What Carbon Nanotubes (CNT) nanomaterials can be produced on the EasyTube systems?
  2. What kind of Nanowire nanomaterials can be produced on the EasyWire systems?
  3. What is the specification of the nanomaterials?
  4. What catalyst is typically used for nanomaterial synthesis?
  5. How is the catalyst prepared?
  6. What are the precursors?
  7. What type of substrates can be used?
  8. What kind of systems does First Nano offer?
  9. Are recipes provided with the EasyTube and EasyWire systems?
  10. What is the difference between EasyTube™ 2000 and EasyTube™ 3000 system?
  11. What is the throughput of an EasyTube system?

1. What Carbon Nanotubes (CNT) nanomaterials can be produced on the EasyTube systems?

  • Single Wall Carbon Nanotube (SWNT)
  • Multi Wall Carbon Nanotube (MWNT)
  • Vertically aligned Carbon Nanotube (VACNT)
  • Horizontally aligned Carbon Nanotube (HACNT)
  • Bulk Carbon Nanotubes

2. What kind of Nanowire nanomaterials can be produced on the EasyWire systems?

  • Silicon Nanowire (SiNW)
  • Bulk Silicon Nanowire(SiNW)
  • Vertically aligned Silicon Nanowire (SiNW)
  • Germanium Nanowire
  • Zinc Oxide (ZnO) Nanowire
  • Gallium Nitride (GaN) Nanowire
  • Others

3. What is the specification of the nanomaterials?

  • Single Wall Carbon Nanotube (SWNT)
    • Diameter from 1 to 3 nm
    • Length from a few µm to tens µm
  • Multi Wall Carbon Nanotube (MWNT)
    • Diameter from 5 to 20 nm
    • Length from a few µm to hundreds of µm.
  • Vertically aligned Carbon Nanotube (VACNT)
    • Diameter from 10 to 20 nm
    • Length from a few µm to a few millimeters.
  • Silicon Nanowire (SiNW)
    • Diameter from 10 nm to 100 nm
    • Length up to tens of µm

4. What catalyst is typically used for nanomaterial synthesis?

  • For Carbon Nanotube growth
    • Nickel (Ni) for Carbon Nanotube growth
    • Cobalt (Co) for Carbon Nanotube growth
  • For Nanowire growth
    • Gold nanoparticles for Silicon Nanowire (SiNW)
    • Gold nanoparticles for Zinc Oxide (ZnO) Nanowire

5. How is the catalyst prepared?

  • As a solution form then spin-coated onto the substrate
  • By sputtering or electron beam evaporation of a thin film onto a substrate

6. What are the precursors?

  • Precursors for Carbon Nanotube growth
    • Gas precursors
      • Methane (CH4)
      • Ethylene (C2H4)
      • Acetylene (C2H2)
      • Hydrogen (H2)
      • Others
    • Liquid precursors
      • Ethanol (C2H5OH)
      • Water (H2O)
      • Others
  • Precursors for Nanowire growth
    • Gas precursors
      • Silane (SiH4) for Silicon Nanowires
      • Hydrogen (H2)
    • Liquid precursors
      • Silicon tetrachloride (SiCl4)
    • Solid precursors
      • Zinc Oxide powder for Zinc Oxide Nanowires
      • Others

7. What type of substrates can be used?

  • Silicon
  • Silicon substrates with metal coatings
  • Copper
  • Molybdenum
  • Quartz
  • Glass - can be used with low temperature (<550 Celsius) processes

8. What kind of systems does First Nano offer?

9. Are recipes provided with the EasyTube and EasyWire systems?

Yes - First Nano can provide recipes for:

  • Single Wall Carbon Nanotube (SWNT)
  • Multi-wall Carbon Nanotube (MWNT)
  • Vertically aligned Carbon Nanotube
  • Horizontally aligned Carbon Nanotube
  • Silicon Nanowire (SiNW)
  • The First Nano research team can develop other nanowires synthesis on our EasyWire system
  • First Nano also provides assistance to customers on new process development

10. What is the difference between EasyTube® 2000 and EasyTube® 3000 system?

Both ET2000 and ET3000 are modular system with multiple options.

  • ET2000 is a three inch tube system with smaller footprint
  • ET3000 is larger than the ET2000 and can be equipped with:
    • Loadlock
    • Five inch process tube

11. What is the throughput of an EasyTube system?

  • A complete run includes these steps:
    • Purge with Argon (AR) or evacuate to base pressure if you have the vacuum option
    • Heating to growth temperature
    • Processing at growth temperature
    • Cooling
  • Most systems take 3 hours or more for the furnace to cool down from 900 °C to 50 °C.
  • The EasyTube® system uses a unique design that allows the furnace to automatically open during the cool down stage reducing the time to less than an hour and total process time to 90 to 120 minutes.
  • In the EasyTube® 3000 system equipped with a Loadlock, the sample can be unloaded from the process tube at full temperature and cooled inside the Loadlock while keeping furnace at high temperature. It saves both cooling time and furnace heating time. A complete process can be finished within one hour.

EasyCrystal™ Bridgman Furnace System

easycrystal vertical bridgman furnace

Vertical Growth (Bridgman) Furnace System is an advanced process tool for the growth of crystals...
more

EasyPanel™ System

easypanel uhp gas panel

UHP Gas Panels for high and low pressure, Ultra-High-Purity (UHP) gas delivery...
more

EasyExhaust™ System

easyexhaust system - high temp furnace and water scrubbing system

High Temperature Pyrolizing Furnace and Water Scrubbing System capable of continually thermally...
more

EasyGas™ 1000

easygas 1000 gas cabinet

High Quality Gas Cabinets and Gas Delivery Systems designed to cover a wide range of cylinder gas delivery...
more

EasyGas™ 1500

easygas 1500 gas cabinet

Fully Automated Gas Cabinet providing reliable Ultra-High-Purity (UHP) specialty gas equipment...
more

EasyTube® 101

easytube 101 advanced cvd process tool

Advanced CVD process development tool for the University or Industrial Researcher...
more

EasyTube® 2000

easytube 2000 thermal cvd

Advanced turnkey thermal catalytic CVD process tool for synthesis of nanotube and nanowire...
more

EasyTube® 2000 - VACNT Array

vertically aligned CNT

Vertically Aligned CNT array...
more

EasyTube® 2000 - Fastcool™ Furnace

high throughput furnace

FastCool™ Furnace for High Throughput, provides better temperature stability and uniformity over...
more

EasyTube® 2000 - Automated Wafer Loading

easytube 2000 Automated Wafer Loading

Ensures contamination-free handling and consistent gas sealing ...
more

EasyTube® 2000 - Hot Loader and FastCool™ Furnace

Hot Loader and FastCool™ Furnace

Hot Loader to Load Sample into a Pre-Heated Chamber....
more

EasyTube® 2000 - HTA High Temperature Annealing System

EasyTube® 2000 - HTA High Temperature Annealing System

Graphite Resistance Heated High Temperature Annealing (HTA) System is an automatically...
more

EasyTube® 3000

easytube 3000 cnt and nanowire cvd system

Advanced Catalytic CNT and Nanowire CVD System process tool for...
more

EasyTube® 3000 - High Purity Graphite Susceptor

Loadlock with a 3 inch wafer on a high purity graphite susceptor

Loadlock with a 3 inch wafer on a high purity graphite susceptor loading...
more

EasyTube® 3000 - RF Plasma

easytube 3000 rf plasma

Remote RF Plasma used to ionize gas prior to entering the thermal deposition...
more

EasyTube® 3000 - CNT's Batch Synthesis

EasyTube 3000 - CNT Batch Synthesis

Vertically aligned CNT's are produced on a batch of 4″ wafers...
more

EasyTube® 3000 - High Throughput Loader

EasyTube 3000 - High Throughput Loader

The High Throughput Loader enables fast sample heating to improve nanotube...
more

EasyTube® 3000 - Infrared Heating Furnace

EasyTube 3000 - Infrared Heating Furnace

Infrared Heating Furnace provides Rapid Thermal Process (RTP) capability...
more

EasyTube® 4000 PECVD System

easytube 4000 advanced plasma cvd system

Advanced Plasma Enhanced CVD process tool for the synthesis of...
more

EasyTube® 5000 MOCVD System

easytube 500 mocvd equipment

MOCVD System, advanced research Reactor for depositing a wide variety of III-V and II-VI layers...
more

EasyTube® 6000

easytube 6000 advanced multi furnace system

Advanced Multi-Tube Furnace System for Carbon Nanotubes (CNT), Nanowires, Oxidation...
more

EasyTube® 6000 - Batch Wafer Process

EasyTube 6000 - Batch Wafer Process

Utilizes a Cantilevered Loading System and has...
more

EasyTube® 8000 - Fluidized Bed Reactor

EasyTube® 2000 - HTA High Temperature Annealing System

RF Induction Heated EasyTube®8000 Series Fluidized Bed Chemical Vapor Deposition System is...
more

First Nano, a division of
CVD Equipment Corporation
355 South Technology Drive
Central Islip, NY 11722 USA
(P) 631.981.7081
(F) 631.981.7095


© 2013 First Nano, a division of CVD Equipment Corporation
355 South Technology Drive | Central Islip, NY 11722 | Tel 631.981.7081 | Fax 631.981.7095
Home | Company | Products | Applications | Application Lab | RFQ | Contact | Privacy | www.firstnano.com