Questions & Answers

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1. What Carbon Nanotubes (CNT) nanomaterials can be produced on the EasyTube systems?
   
2. What kind of Nanowire nanomaterials can be produced on the EasyWire systems?
   
3. What is the specification of the nanomaterials?
   
4. What catalyst is typically used for nanomaterial synthesis?
   
5. How is the catalyst prepared?
   
6. What are the precursors?
   
7. What type of substrates can be used?
   
8. What kind of systems does First Nano offer?
   
9. Are recipes provided with the EasyTube and EasyWire systems?
   
10. What is the difference between EasyTube™ 2000 and EasyTube™ 3000 system?
    
11. What is the throughput of an EasyTube system?

1. What Carbon Nanotubes (CNT) nanomaterials can be produced on the EasyTube systems?

• Single Wall Carbon Nanotube (SWNT)
• Multi Wall Carbon Nanotube (MWNT)
• Vertically aligned Carbon Nanotube (VACNT)
• Horizontally aligned Carbon Nanotube (HACNT)
• Bulk Carbon Nanotubes

2. What kind of Nanowire nanomaterials can be produced on the EasyWire systems?

• Silicon Nanowire (SiNW)
• Bulk Silicon Nanowire(SiNW)
• Vertically aligned Silicon Nanowire (SiNW)
• Germanium Nanowire
• Zinc Oxide (ZnO) Nanowire
• Gallium Nitride (GaN) Nanowire
• Others

3. What is the specification of the nanomaterials?

• Single Wall Carbon Nanotube (SWNT)
  • Diameter from 1 to 3 nm
  • Length from a few µm to tens µm
• Multi Wall Carbon Nanotube (MWNT)
  • Diameter from 5 to 20 nm
  • Length from a few µm to hundreds of µm.
• Vertically aligned Carbon Nanotube (VACNT)
  • Diameter from 10 to 20 nm
  • Length from a few µm to a few millimeters.
    
• Silicon Nanowire (SiNW)
  • Diameter from 10 nm to 100 nm
  • Length up to tens of µm

4. What catalyst is typically used for nanomaterial synthesis?

• For Carbon Nanotube growth
  • Nickel (Ni) for Carbon Nanotube growth
  • Cobalt (Co) for Carbon Nanotube growth
    
• For Nanowire growth
  • Gold nanoparticles for Silicon Nanowire (SiNW)
  • Gold nanoparticles for Zinc Oxide (ZnO) Nanowire

5. How is the catalyst prepared?

• As a solution form then spin-coated onto the substrate
• By sputtering or electron beam evaporation of a thin film onto a substrate

6. What are the precursors?

• Precursors for Carbon Nanotube growth
  • Gas precursors
    • Methane (CH4)
    • Ethylene (C2H4)
    • Acetylene (C2H2)
    • Hydrogen (H2)
    • Others
  • Liquid precursors
    • Ethanol (C2H5OH)
    • Water (H2O)
    • Others
• Precursors for Nanowire growth
  • Gas precursors
    • Silane (SiH4) for Silicon Nanowires
    • Hydrogen (H2)
  • Liquid precursors
    • Silicon tetrachloride (SiCl4)
  • Solid precursors
    • Zinc Oxide powder for Zinc Oxide Nanowires
    • Others

7. What type of substrates can be used?

• Silicon
• Silicon substrates with metal coatings
• Copper
• Molybdenum
• Quartz
• Glass - can be used with low temperature (<550 Celsius) processes

8. What kind of systems does First Nano offer?

• EasyTube^® 101
• EasyTube^® 2000
• EasyTube^® 3000
• EasyTube^® 4000
• EasyTube^® 5000
• EasyTube^® 6000
• EasyTube^® 8000
• EasyWire™ 3000
• Customized systems
• Supporting equipment
  • EasyPanel™ Gas Panel
  • EasyGas™ Gas Cabinet
  • EasyExhaust™ Gas Burn Box

9. Are recipes provided with the EasyTube and EasyWire systems?

Yes - First Nano can provide recipes for:

• Single Wall Carbon Nanotube (SWNT)
• Multi-wall Carbon Nanotube (MWNT)
• Vertically aligned Carbon Nanotube
• Horizontally aligned Carbon Nanotube
• Silicon Nanowire (SiNW)
• The First Nano research team can develop other nanowires synthesis on our EasyWire system
• First Nano also provides assistance to customers on new process development

10. What is the difference between EasyTube^® 2000 and EasyTube^® 3000 system?

Both ET2000 and ET3000 are modular system with multiple options.

• ET2000 is a three inch tube system with smaller footprint
• ET3000 is larger than the ET2000 and can be equipped with:
  • Loadlock
  • Five inch process tube

11. What is the throughput of an EasyTube system?

• A complete run includes these steps:
  • Purge with Argon (AR) or evacuate to base pressure if you have the vacuum option
  • Heating to growth temperature
  • Processing at growth temperature
  • Cooling
• Most systems take 3 hours or more for the furnace to cool down from 900 °C to 50 °C.
• The EasyTube^® system uses a unique design that allows the furnace to automatically open during the cool down stage reducing the time to less than an hour and total process time to 90 to 120 minutes.
• In the EasyTube^® 3000 system equipped with a Loadlock, the sample can be unloaded from the process tube at full temperature and cooled inside the Loadlock while keeping furnace at high temperature. It saves both cooling time and furnace heating time. A complete process can be finished within one hour.

First Nano, a division of
CVD Equipment Corporation
355 South Technology Drive
Central Islip, NY 11722 USA
(P) 631.981.7081
(F) 631.981.7095