What is rapid thermal processing (RTP)?
Rapid thermal processing (RTP) is required when there is a reduced thermal budget, for example in dopant activation. RTP also allows for reduced process cycle times, hence higher production throughput.
What can our FirstNano® systems do?
FirstNano® EasyTube® CVD systems can be configured with Rapid Thermal Processing (RTP) capability, including single and multi-zone systems using orthogonal linear, parallel linear, or axisymmetrical infrared lamps. Our RTP systems can process at temperatures from 400 °C up to > 1300 °C. Fast response and low thermal mass allows for temperature ramping > 100 °C / second.
How is RTP applied commercially?
RTP is used for oxidation, annealing, deposition of silicon dioxide and silicon nitride, contact alloying, tin oxide, gallium arsenide implant activation, phosphate silicate glass (PSG) and boron phosphate silicate glass (BPSG) reflow, silicon dielectrics, and many other processes.
FirstNano® system platforms configurable for RTP.
EasyTube® 2000 (50 mm x 50 mm Substrate)
EasyTube® 3000 (100 mm x 100 mm Substrate)
